Chlorosilane

Chlorosilane (Monochlorosilane, SiH₃Cl, CAS 13465-78-6) se yon gaz san koulè, piroforik ak yon odè pike, enèvan. Bouyi nan -30.4 degre ak limen espontaneman sou kontak ak lè (autoignition<20 °C), it is one of the most reactive members of the chlorosilane family. Freely soluble in carbon tetrachloride, carbon disulfide, ether, and THF, it hydrolyzes violently with moisture to release hydrogen chloride and flammable hydrogen gas. As a critical silicon-source precursor in CVD processes, chlorosilane is widely used for epitaxial silicon wafer growth, polysilicon thin-film deposition, SiC film fabrication for power devices, and the synthesis of organosilicon monomers (silicone oils, rubbers, resins, coupling agents). Classified as water-reactive, pyrophoric, and highly toxic (UN 2986, Class 4.3+2.3, PG I); handle only in sealed cylinders under dry inert atmosphere, strictly isolated from air, moisture, and combustibles.